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Advances in Imaging & Electron Physics

  • 1 Edición, Volumen 238 - 1 de junio de 2026
  • Última edición
  • Editor: Martin Hÿtch
  • Idioma: Inglés

Advances in Imaging and Electron Physics, Volume 238 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microsc… Leer más

Descripción

Advances in Imaging and Electron Physics, Volume 238 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.

Puntos claves

  • Provides the authority and expertise of leading contributors from an international board of authors
  • Presents the latest release in the Advances in Imaging and Electron Physics series

De interès para

Physicists, electrical engineers, applied mathematicians in all branches of image processing and microscopy as well as electron physics in general

Índice

  • Preface
  • Numerical Methods for Computing Electrostatic and Magnetic Fields
  • Methods of Computing Optical Properties and Combating Aberrations for Low-Intensity Beams
  • Emittance and Brightness: Definitions and Measurements*
  • High-Resolution Scanning Transmission Low-Energy Ion Microscopes and Microanalyzers
  • High-Energy Ion Microprobes

Detalles del producto

  • Edición: 1
  • Última edición
  • Volumen: 238
  • Publicado: 1 de julio de 2026
  • Idioma: Inglés

Sobre el editor

MH

Martin Hÿtch

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.
Afiliaciones y experiencia
Senior Scientist, French National Centre for Research (CNRS), Toulouse, France