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Frontiers of Thin Film Technology

  • 1 Edición, Volumen 28 - 20 de octubre de 2000
  • Última edición
  • Editores: Maurice H. Francombe, Stephen M. Rossnagel, Abraham Ulman
  • Idioma: Inglés

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and charac… Leer más

Descripción

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures.

Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

De interès para

Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.

Detalles del producto

  • Edición: 1
  • Última edición
  • Volumen: 28
  • Publicado: 7 de noviembre de 2000
  • Idioma: Inglés

Sobre los editores

MF

Maurice H. Francombe

Afiliaciones y experiencia
Georgia State University, Atlanta, U.S.A.

SR

Stephen M. Rossnagel

Afiliaciones y experiencia
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.

AU

Abraham Ulman

Afiliaciones y experiencia
Polytechnic University, Brooklyn, New York, U.S.A.

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