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Elsevier

Principles of Vapor Deposition of Thin Films

  • 1 Edición - 16 de diciembre de 2005
  • Última edición
  • Autor: Professor K.S. K.S Sree Harsha
  • Idioma: Inglés

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in… Leer más

Descripción

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

Puntos claves

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

De interès para

Graduate students interested in entering electronics materials industry and other thin film device technology areas. Students in materials and electronic engineering. Professionals in the materials science industry.

Detalles del producto

  • Edición: 1
  • Última edición
  • Publicado: 16 de diciembre de 2005
  • Idioma: Inglés

Sobre el autor

PS

Professor K.S. K.S Sree Harsha

Afiliaciones y experiencia
Emeritus Professor of Materials Engineering, San Jose State University, San Jose.

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