PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
- 1 Edición, Volumen 26 - 29 de octubre de 1998
- Última edición
- Editores: Stephen M. Rossnagel, Ronald Powell, Abraham Ulman
- Idioma: Inglés
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the proper… Leer más
Descripción
Descripción
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
De interès para
De interès para
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics
Índice
Índice
Useful Conversion Factors and Constants. Introduction. Physics of Sputtering. Plasma Systems. The Planar Magnetron. Sputtering Tools. Directional Deposition. Planarized PVD: Use of Elevated Temperature and/or High Pressure. Ionized Magnetron Sputter Deposition. PVD Materials and Processes. Process Modeling for Magnetron Deposition. Sputtering Targets. Index.
Detalles del producto
Detalles del producto
- Edición: 1
- Última edición
- Volumen: 26
- Publicado: 6 de agosto de 2011
- Idioma: Inglés
Sobre los editores
Sobre los editores
SR
Stephen M. Rossnagel
Afiliaciones y experiencia
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.RP
Ronald Powell
Afiliaciones y experiencia
Novellus Systems, Inc., Palo Alto, CaliforniaAU
Abraham Ulman
Afiliaciones y experiencia
Polytechnic University, Brooklyn, New York, U.S.A.Ver libro en ScienceDirect
Ver libro en ScienceDirect
Lee PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing en ScienceDirect