Thin Films for Advanced Electronic Devices
Advances in Research and Development
- 1 Edición, Volumen 15 - 23 de abril de 1991
- Última edición
- Editores: Maurice H. Francombe, John L. Vossen
- Idioma: Inglés
In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive… Leer más
Descripción
Descripción
In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.
De interès para
De interès para
Researchers, students, and engineers concerned with electronic materials and devices, thin film physics, and materials science.
Índice
Índice
J.D. Adam, M.R. Daniel, P. Emtage, and S.H. Talisa, Magnetostatic Waves. B.S. Krusor and G.A.N. Connell, Thin-Film Rare Earth-Transition Metal Alloys for Magneto-Optic Recording. D.D. Coon and K.M.S.V. Bandara, New Quantum Structures. D.M. Back, Fourier Transform Infrared Analysis of Thin Films.
Reseñas
Reseñas
"I have no doubt that this volume's section on new quantum structures will be of great interest to quantum device researchers."—DR. R.P.G. KARUNASIRI, UNIVERSITY OF CALIFORNIA, LOS ANGELES
Detalles del producto
Detalles del producto
- Edición: 1
- Última edición
- Volumen: 15
- Publicado: 23 de abril de 1991
- Idioma: Inglés
Sobre los editores
Sobre los editores
MF
Maurice H. Francombe
Afiliaciones y experiencia
Georgia State University, Atlanta, U.S.A.JV
John L. Vossen
Afiliaciones y experiencia
RCA Laboratories, Princeton, New JerseyVer libro en ScienceDirect
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