Saltar al contenido principal

Thin Films for Advanced Electronic Devices

Advances in Research and Development

  • 1 Edición, Volumen 15 - 23 de abril de 1991
  • Última edición
  • Editores: Maurice H. Francombe, John L. Vossen
  • Idioma: Inglés

In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive… Leer más

Descripción

In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.

De interès para

Researchers, students, and engineers concerned with electronic materials and devices, thin film physics, and materials science.

Índice

J.D. Adam, M.R. Daniel, P. Emtage, and S.H. Talisa, Magnetostatic Waves. B.S. Krusor and G.A.N. Connell, Thin-Film Rare Earth-Transition Metal Alloys for Magneto-Optic Recording. D.D. Coon and K.M.S.V. Bandara, New Quantum Structures. D.M. Back, Fourier Transform Infrared Analysis of Thin Films.

Reseñas

"I have no doubt that this volume's section on new quantum structures will be of great interest to quantum device researchers."—DR. R.P.G. KARUNASIRI, UNIVERSITY OF CALIFORNIA, LOS ANGELES

Detalles del producto

  • Edición: 1
  • Última edición
  • Volumen: 15
  • Publicado: 23 de abril de 1991
  • Idioma: Inglés

Sobre los editores

MF

Maurice H. Francombe

Afiliaciones y experiencia
Georgia State University, Atlanta, U.S.A.

JV

John L. Vossen

Afiliaciones y experiencia
RCA Laboratories, Princeton, New Jersey

Ver libro en ScienceDirect

Lee Thin Films for Advanced Electronic Devices en ScienceDirect