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Thin Films for Emerging Applications

  • 1 Edición, Volumen 16 - 6 de julio de 1992
  • Última edición
  • Editores: Maurice H. Francombe, John L. Vossen
  • Idioma: Inglés

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin… Leer más

Descripción

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.

De interès para

Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.

Índice

N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.

Detalles del producto

  • Edición: 1
  • Última edición
  • Volumen: 16
  • Publicado: 22 de octubre de 2013
  • Idioma: Inglés

Sobre los editores

MF

Maurice H. Francombe

Afiliaciones y experiencia
Georgia State University, Atlanta, U.S.A.

JV

John L. Vossen

Afiliaciones y experiencia
RCA Laboratories, Princeton, New Jersey

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